Fig. 1.3-I : example of an exposure taken on the ground (MPE Panter facility) without optics and with a multipinhole mask in the beam. This particular exposure is in Al light (1.5 keV). Several exposures like this, with the mask shifted by fractions of the hole pitch, have been used to construct linearisation and gain maps. :: original creation 2002 Sep 04 16:22:56 CEST :: last edit 2002 Sep 04 16:22:56 CEST